Rf energy application based on electromagnetic feedback

ABSTRACT

Method of processing an object in a cavity by application of radio frequency (RF) energy via a plurality of radiating elements. The method comprising applying a first amount of RF energy to the cavity at a first plurality of excitation setups, wherein applying energy at each excitation setup of the first plurality of excitation setups comprises applying RF energy via a plurality of radiating elements at a common frequency and during overlapping time periods. For each radiating element, one measures during the application of each of the plurality of excitation setups, electromagnetic feedback. The method further includes applying a second amount of RF energy to the energy application zone at one or more excitation setups, at least one of which is not included in the first plurality of excitation setups and selected based on the electromagnetic feedback.

This application claims the benefit of priority to U.S. ProvisionalPatent Applications Nos. 61/667,078 and 61/712,356, filed on Jul. 2,2012 and Oct. 11, 2012, respectively, which are incorporated herein intheir entirety.

TECHNICAL FIELD

This is a Patent Application relating to a device and method forapplying electromagnetic energy, and more particularly, but notexclusively, to device and method for applying RF energy based onelectromagnetic feedback.

Electromagnetic waves have been used in various applications to supplyenergy to objects. In the case of radio frequency (RF) radiation forexample, electromagnetic energy may be supplied using a magnetron, whichis typically tuned to a single frequency for supplying electromagneticenergy only in that frequency. One example of a commonly used device forsupplying RF energy is a microwave oven. Typical microwave ovens supplyelectromagnetic energy at or about a single frequency of 2.45 GHz.

SUMMARY OF A FEW EXEMPLARY ASPECTS OF THE DISCLOSURE

The drawings and detailed description which follow contain numerousalternative examples consistent with the invention. A summary of everyfeature disclosed is beyond the object of this summary section. For amore detailed description of exemplary aspects of the invention,reference should be made to the drawings, detailed description, andclaims, which arc incorporated into this summary by reference.

An aspect of some embodiments of the invention may include a method ofprocessing an object in an energy application zone by application ofradio frequency (RF) energy via a plurality of radiating elements. Themethod may include: (a) applying a first amount of RF energy to theenergy application zone at a first plurality of excitation setups and(b) applying a second amount of RF energy to the energy application zoneat one or more excitation setups, not included in the first plurality ofexcitation setups, based on feedback received from the energyapplication zone in response to the application of the first amount ofenergy to the energy application zone at the first plurality ofexcitation setups. In some embodiments, applying RF energy at the one ormore excitation setups may include applying energy at two or moreradiating elements at a controlled phase difference or combination ofone or more phase differences (hereinafter phase relation or phasecombination).

An aspect of some embodiments of the invention may include an apparatusfor processing an object in an energy application zone with radiofrequency (RF) energy applied via a plurality of radiating elements. Theapparatus may include a detection unit and a controller. The detectionunit may be configured to detect electromagnetic feedback from theenergy application zone. The controller may be configured to causeapplication of a first amount of RF energy to the energy applicationzone at a first plurality of excitation setups; receive, from thedetection unit, feedback resulting from the application of the firstamount of RF energy at the first plurality of excitation setups; andcause, based on the feedback received from the detection unit,application of a second amount of RF energy to the energy applicationzone at one or more excitation setups not included in the firstplurality of excitation setups. The processor may be configured to causethe application of the second amount of RF energy through two or moreradiating elements at a controlled phase relation,

An aspect of some embodiments of the invention may include a method ofprocessing an object in an energy application zone by application ofradio frequency (RF) energy via a plurality of radiating elements. Themethod may include applying RF energy repetitively, wherein eachrepetition comprises: (a) applying a first amount of RF energy to theenergy application zone at a first plurality of excitation setupsthrough one radiating element at a time; and (b) applying a secondamount of RF energy to the energy application zone at one or moreexcitation setups via two or more radiating elements at overlapping timeperiods, at a common frequency, and at controlled phase relations. Insome embodiments, an average amount of energy applied per excitationsetup during the second energy application may be larger than theaverage amount of energy applied per excitation setup during the firstenergy application,

An aspect of some embodiments of the invention may include an apparatusfor processing an object in an energy application zone by application ofradio frequency (RF) energy via a plurality of radiating elements. Theapparatus may include a controller configured to; (a) cause applicationof a first amount of RF energy to the energy application zone at a firstplurality of excitation setups through one radiating element at a time;and (b) cause application of a second amount of RF energy to the energyapplication zone at one or more excitation setups via two or moreradiating elements at overlapping time periods, at a common frequency,and at controlled phase relation, based on feedback received from theenergy application zone in response to the application of the firstamount of energy.

An aspect of some embodiments of the invention may include a method ofprocessing an object in an energy application zone by applying RF energyto the energy application zone at excitation setups, each beingcharacterized by two or more radiating elements that emit, atoverlapping time periods, signals of a common frequency. The method mayinclude: calculating values indicative of energy absorbable in theobject at multiple excitation setups, characterized by a commonfrequency and differing phase combinations, amplitude combinations, orboth phase combinations and amplitude combinations, the calculationbeing based on measurements taken at other excitation setupscharacterized by the common frequency, and applying the RF energy basedon the calculated values.

An aspect of some embodiments of the invention may include an apparatusfor processing an object in an energy application zone by applying RFenergy to the energy application zone at excitation setups, each beingcharacterized by two or more radiating elements that emit, atoverlapping time periods, signals of a common frequency. The apparatusmay include a processor configured to; calculate values indicative ofenergy absorbable in the object at multiple excitation setupscharacterized by a common frequency, based on measurements taken atother excitation setups characterized by the common frequency, themultiple excitation setups being further characterized by differingphase combinations, amplitude combinations, or both phase combinationsand amplitude combinations, and regulate a source to apply the RF energybased on the calculated values.

An aspect of some embodiments of the invention may include an apparatusfor processing an object in an energy application zone by application ofradio frequency (RF) energy via a plurality of radiating elements. Theapparatus may include at least one controller configured to:

-   -   (a) cause application of a first amount of RF energy to the        energy application zone at a common frequency through one        radiating element at a time; and    -   (b) cause application of a second amount of RF energy to the        energy application zone via two or more radiating elements at        overlapping time periods, at the common frequency and at        controlled phase relations, based on feedback received from the        energy application zone in response to the application of the        first amount of energy.

In some embodiments, the at least one controller may be furtherconfigured to

determine absorption efficiencies at a plurality of phase relationsbased on the feedback;

-   -   select one or more of the plurality of phase relations based on        the determined absorption efficiencies; and    -   cause application of the second amount of energy at the selected        one or more phase relations,

An aspect of some embodiments of the invention may include an apparatusfor processing an object in an energy application zone with radiofrequency (RF) energy via a plurality of radiating elements. Theapparatus may include a processor configured to:

receive feedback at a first plurality of excitation, setups;

calculate control parameters at each excitation setup of a secondplurality of excitation setups, the second plurality comprising at leastone excitation setup not comprised in the first plurality; and

cause application of RF energy at one or more of the excitation setupsincluded in the second plurality, based on the calculated controlparameters. A control parameter may be arty parameter, according towhich energy application may be controlled. In some embodiments, thecontrol parameters are indicative of the response of the energyapplication zone with the object therein to an incoming electricalsignal, for example, a parameters, other network parameters, gammaparameters, or combinations thereof, for example, dissipation ratios.

In some embodiments, a number of excitation setups included in thesecond plurality of excitation setups is larger than a number ofexcitation setups included in the first plurality of excitation setupsby a factor equal to 4 or more.

In some embodiments, the processor may be configured to causeapplication of RF energy at the one or more excitation setups via two ormore of the radiating elements at overlapping time periods and at acommon frequency.

In some embodiments, the processor may be configured to causeapplication of RF energy at the first plurality of excitation setups viatwo or more of the radiating elements at overlapping time periods and ata common frequency.

In some embodiments, the feedback includes substantially only absolutevalues or other real values. In some embodiments, complex controlparameters may be calculated based on real feedback values.

In some embodiments, the processor may be configured to causeapplication of RF energy at one or more of the excitation setupsincluded in the second plurality, based only on the absolute values ofthe calculated control parameters.

In sortie embodiments; the processor may be configured to calculate thecontrol parameters based on absolute values only.

An aspect of settle embodiments of the invention may include a method ofprocessing an object in an energy application zone by application ofradio frequency (RF) energy via a plurality of radiating elements. Themethod may include:

-   -   (a) applying a first amount of RF energy to the energy        application zone at a first plurality of excitation setups;    -   (b) calculating, based on feedback received from the energy        application zone during the application of the first amount of        energy, S parameters at one or more excitation setups not        included in the first plurality of excitation setups; and    -   (c) applying, based on the calculated S parameters, a second        amount of RF energy to the energy application zone at one or        more excitation setups not included in the first plurality of        excitation setups.

In some embodiments, the second amount of RF energy may be appliedthrough multiple radiating elements at a common frequency and duringoverlapping time periods.

In some embodiments, the second amount of RF energy may be appliedthrough multiple radiating elements at controlled phase relations.

In some embodiments, calculating comprises analytically calculating.

In some embodiments, the method includes multiple repetitions of (a),(b), and (c). In some such embodiments, in at least one of therepetitions, applying the second amount of energy is accomplished byapplying energy only at excitation setups not included in the firstplurality of excitation setups.

In some embodiments, the method may include:

-   -   calculating S parameters at a second plurality of excitation        setups;    -   selecting the one or more excitation setups from the second        plurality of excitation setups based on the calculated S        parameters; and

applying the second amount of RF energy at the selected one or moreexcitation setups.

In some embodiments, calculating comprises calculating S parameters atsome excitation setups based on gamma parameters measured at otherexcitation setups,

In some embodiments, calculating comprises calculating complex Sparameters based on scalar gamma parameters.

In some embodiments, the first amount of RF energy is applied throughmultiple radiating elements at controlled phase relations.

In some embodiments, calculating comprises calculating S parameters atexcitation setups that comprise phase relations.

BRIEF DESCRIPTION OF THE DRAWINGS

Some embodiments of the invention are herein described, by way ofexamples only, with reference to the accompanying drawings. Withspecific references now to the drawings in detail, it is contemplatedthat the particulars shown are exemplary and for purposes ofillustrative discussion only. In this regard, the description of thedrawings provides examples to those skilled in the art how embodimentsof the invention may be practiced,

FIG. 1A is a diagrammatic representation of an apparatus for applyingelectromagnetic energy to an object, in accordance with some exemplaryembodiments of the present invention;

FIG. 1B is a diagrammatic representation of an apparatus for applyingelectromagnetic energy to an object, in accordance with some exemplaryembodiments of the present invention;

FIG. 2 is a diagrammatic representation of an apparatus for applyingelectromagnetic energy to an object, in accordance with some exemplaryembodiments of the present invention;

FIG. 3 is a flow chart of a method for applying electromagnetic energyto an energy application zone in accordance with some embodiments of thepresent invention;

FIG. 4 is a diagrammatic representation of time durations, during whichtwo radiating elements of an energy application unit may operate duringexecution of a method according to some embodiments of the invention;

FIG. 5 is a diagrammatic presentation of a method according to someembodiments of the invention; and

FIG. 6 is a diagrammatic presentation of a processor according to someembodiments of the invention,

DETAILED DESCRIPTION

Reference will now be made in detail to exemplary embodiments of theinvention, examples of which are illustrated in the accompanyingdrawings. When convenient, the same reference numbers are usedthroughout the drawings to refer to the same or like parts.

Disclosed embodiments may involve apparatus and methods for processing(e.g., heating) an object, in an energy application zone, by applying RFenergy. An aspect of some embodiments of the invention relates tocoherent application of RF energy. As used herein, coherent applicationof energy includes energy application through two or more radiatingelements at the same time and at the same frequency. In other words,coherent application of energy includes energy application through twoor more radiating elements at overlapping time periods and at a commonfrequency. Coherent energy application may cause excitation of a largevariety of field patterns even at a single frequency. This may beadvantageous, for example, for enhancing heating uniformity, sincedifferent field patterns may cause heating at different regions acrossthe energy application zone, and variety of field patterns may causeheating at a many different regions across the energy application zone,thus enhancing heating uniformity. Enlarging the variety of fieldpatterns in non-coherent energy application may be achieved, forexample, by applying energy at various frequencies (e.g., at a frequencyband), however, the frequency bands available for industrial,scientific, or medical usage (ISM bands) are limited. Coherent energyapplication may make use of the limited bandwidth to excite a variety offield patterns at each frequency.

Coherent energy application may be characterized by the frequency atwhich energy is applied, amplitudes of signals emitted by different onesof the radiating elements, and phases differences between signalsemitted by different ones of the radiating elements. When three or moreradiating elements take part in the coherent energy application, forexample, radiating elements A, B, and C, more than one phase differencemay exist. For example, one phase difference may exist between signalsemitted by radiating elements A and B, and another phase difference mayexist between signals emitted by radiating elements A and C. In thefollowing, the term phase combination will be used to refer to phasedifferences between two, three, or more radiating elements, with theunderstanding that in case of two radiating elements the combinationincludes a single phase difference. Similarly, the term amplitudecombination will be used. A combination of frequency, phase combination,and amplitude combination will be referred to herein as an excitationsetup. The term phase combination is used herein interchangeably withphase relation, and the term amplitude combination is used hereininterchangeably with amplitude relation.

In some embodiments of the invention, the application of energy is basedon feedback from the energy application zone. For example, the feedbackmay be indicative of quality of the processing, and the feedback mayenable association of different quality values with different excitationsetups. Then, excitation setups may be selected based on qualitiesassociated with them, and energy may be applied, for example, only atexcitation setups associated with desired heating qualities. Differentembodiments may utilize different qualities. For example, in someembodiments, a quality may be related to the absorption efficiency ofthe energy application zone at the corresponding excitation setup. In aspecific example, the energy application zone may include the object tobe heated, and the zone with the object therein may absorb some of theenergy applied to it. Some of the absorbed energy may he absorbed in theobject to cause heating of the object. In some embodiments, moreabsorbed energy (at a given amount of supplied energy) may be consideredhigher quality. In such embodiments, there may be a minimum threshold,and only excitation setups associated with absorption efficiencies abovethe threshold may be selected or used. The absorption efficiency may bedefined as the ratio between absorbed energy (or power) and suppliedenergy (or power). In some embodiments, at each frequency, theexcitation setups associated with the highest absorption efficiencyvalue or values may be used. These may include, for example, apredetermined number of excitation setups per frequency. For example, ateach frequency, the 10 excitation setups associated with the highestabsorption efficiencies may be selected for energy application. In someembodiments, there may be a maximum threshold for absorption efficiency,and excitation setups associated with higher absorption efficiencies maybe excluded or not selected for application, for example, because theymay be associated with overheating (e,g., burning) of the object In someembodiments, both minimum and maximum thresholds may be used, and insome embodiments, thresholds may be used in combination with a number ofexcitation setups per frequency. These are only some examples of howexcitation setups may be selected based on absorption efficiencies.

When there are many excitation setups to select from, obtaining thefeedback at each excitation setup may require relatively long timeperiods devoted to collecting feedback. In some oases, it may beadvantageous to shorten these time periods. In some embodiments of theinvention, such shortening of feedback collecting periods may beachieved by measuring feedback at some excitation setups, and based onthis feedback, calculating the heating efficiency (or any other qualityindicator) at the other excitation setups.

Thus, in accordance with some aspects of the present invention, there isprovided a method of processing (e.g., heating) an object in an energyapplication zone by applying microwave (or other RF) energy to theenergy application zone. The method may include calculating qualityindicators at some excitation setups based on measurements taken atother excitation setups, and applying the energy based on the qualityindicators. The measurements may include receiving feedback, forexample, as discussed above. In particular, the method may includecalculating quality indicators for a plurality of excitation setups thathave a common frequency and differ in phase combination and/or inamplitude combination.

Similarly, an apparatus for processing an object may be provided with aprocessor configured to calculate quality indicators at some excitationsetups based on feedback values obtained at other excitation setups, andcause application of RF energy to the energy application zone based onthe calculated quality indicators. Here also, the calculation may be forexcitation setups that have a common frequency and differ in phasecombination and/or in amplitude combination. In some embodiments, theprocessor may be configured to send a phase control signal to a sourceof RF energy, to control the phase combination of an excitation setupused for heating.

While the invention is not limited to any particular quality indicatoror to a manner of calculation, the following examples will useabsorption efficiencies (also referred to herein as heatingefficiencies) as examples of quality indicators, and describe twoexemplary methods for calculating them. Absorption efficiencies may beindicative of the dielectric response of the energy application zoneand/or the object to electromagnetic fields excited in the zone. Aquality indicator may include any value indicative of energy absorbablein the object. Such a quality indicator may correspond to or constitute,for example, an absorption efficiency (also referred to herein asdissipation ratio, or DR). In other embodiments, the quality factor mayinclude any variable that relates to the dissipation ratio, including,for example, the loss, which may be expressed as I-DR, a non-normalizedloss, which may be expressed as (I-DR)A, where A stands for the sum ofamplitudes of the signals supplied to generate the excitation setups,etc. Other parameters, which may be used for calculating the dissipationratio or that may otherwise be indicative of a dissipation ratio mayalso be used as quality indicators. A quality indicator may also bereferred to herein as absorbability indicator, or AI.

One way of calculating absorption efficiency at many excitation setupsbased on feedback received at a small number of excitation setups may beby measuring feedback in response to signals applied by each of theradiating elements alone, and then summing up the effect of thesesignals when they are applied during overlapping time periods and atgiven phase combinations and/or amplitude combinations. This summationmay not constitute simple addition, because there may be interferencebetween the signals. If, during the coherent energy application, thereare k radiating elements radiating at overlapping time periods, eachradiating element k radiates at amplitude a_(k) and at a phase φ_(k),the DR may be given by equation A below

$\begin{matrix}{{{DR} = {1 - \frac{\text{?}}{\text{?}}}}{\text{?}\text{indicates text missing or illegible when filed}}} & (A)\end{matrix}$

In equation A, S_(ik) is a scattering parameter (also referred to as Sparameter), defined as

${S_{ik} = \frac{V_{i}^{-}}{V_{k}^{+}}},$

where V_(t) ⁻ as voltage received at radiating element t when voltageV_(k) ⁺ is supplied to radiating element k. The S parameters may berepresented as complex numbers, and each may have a magnitude and aphase. To omit confusion between a phase of an S parameter and a phasedifference between signals emitted concurrently, the terms phasedifference, phase relation, or phase combinations are used herein forthe latter ease. The S parameters may be indicative of the electricalresponse of the cavity to electrical signal applied to the cavity. Thisresponse may depend upon the presence and/or nature of en object in thecavity. Therefore, the electrical response (or S parameters) may beattributed to the cavity and the object, or to the energy applicationzone and the object.

Measuring all the available S parameters may require applying energythrough one radiating element at a time. For example, if four radiatingelements are involved, four transmissions may be sufficient, one througheach radiating element, since each transmission may allow measuring fourS parameters. For example, transmitting through radiating element No. 1allows to measure:S₁₁; S₁₂; S₁₃; and S₁₄. The number of excitationsetups, for which DR may be calculated based on such four transmissionsand equation (A) may be unlimited.

Another way of calculating absorption efficiency at many excitationsetups based on feedback received at a small number of excitation setupsmay involve measuring only scalar parameters, and calculating thecomplex S parameters based on these scalar parameters. Calculating DRbased on the complex S parameters is then allowed using equation (A)above for an unlimited number of excitation setups (e.g., excitationsetups having a common frequency and differing in phase combinations).This approach may have an advantage in that the measurement equipmentmay be less expensive, since there is no need to measure phases offeedback parameters; however, this approach may require moremeasurements and more calculations. A feedback parameter may include anyparameter, the value of which is received as feedback (e.g., Sparameters, gamma parameters) or calculated based on received feedback(e.g., heating efficiency), in some embodiments, the scalar parametersto be measured include the ratios between power received at eachradiating element and power supplied to the same radiating elementduring coherent energy application. Mathematically this may be expressedas

$\begin{matrix}{{DR} = {1 - \frac{\sum_{i = 1}^{n}{a_{i}^{2}{\Gamma_{1}}^{2}}}{\sum_{i = 1}^{n}a_{i}^{2}}}} & (B)\end{matrix}$

wherein |Γ₁|² is the magnitude of a gamma parameter associated with thei^(th) radiating element, P_(ir) is the power received at the “rewind”direction (going from the energy application zone through the i^(th)radiating element to the detector); and P_(if) is the power measured atthe “forward” direction (going from the source to the energy applicationzone through the i^(th) radiating element). Using the gamma parameters,DR may be calculated according to equation (B) below

$\begin{matrix}{{{DR} = {1 - \frac{\text{?}}{\text{?}}}}{\text{?}\text{indicates text missing or illegible when filed}}} & (B)\end{matrix}$

Thus, DR values calculated based on measurement of the gamma parametersat given phase and amplitude combinations may be inserted in equation(A). The number of unknowns in equation A is twice the number of Sparameters (since each has a magnitude and a phase). The number of Sparameters is n², so in the case of four radiating elements discussedabove, there are 32 unknowns. After measuring DR values at 32 excitationsetups; the 32 equations with 52 unknowns may:be solved to obtain thecomplex parameters. It is noted that in practice a smaller number ofmeasurements may be required, because additional equations may exist.For example, with respect to equations relating values of gammaparameters and S parameters, and equations relating S parameters andthemselves, for example, it may be known (at least for some cases) thatS_(ik) S_(ki) for every value of k and l. This alone reduces the numberof unknowns from 32 to 20 in the above example.

In one respect, the invention may involve apparatus and methods forapplying electromagnetic energy. The term electromagnetic energy, asused herein, includes energy deliverable by electromagnetic radiation inthe radio frequency (RF) portion of the electromagnetic spectrum(between 3kHZ and 300 GHz). In some examples, the appliedelectromagnetic energy may fall within frequency bands between 500 MHzto 1500 MHz or between 700 MHz to 1200 MHz or between 800 MHz-1 GHz.Applying energy in the RF portion of the electromagnetic spectrum isreferred herein as applying RF energy. Thus, electromagnetic energy andRF energy are used herein interchangeably. Microwave and ultra highfrequency (UHF) energy, for example, are both within the RF range. Insome other examples, the applied electromagnetic energy may fall onlywithin one or more industrial, scientific and medical (ISM) frequencybands, for example, between 433.05 and 434.79 MHz, between 902 and 928MHz, between 2400 and 2500 MHz, and/or between 5725 and 5875 MHz.

In certain embodiments, the application of electromagnetic energy mayoccur in an “energy application zone”, such as energy application zone 9(also referred herein as cavity), as shown in FIG. 1A or 1B. Energyapplication zone 9 may include any void, location, region, or area whereelectromagnetic energy may be applied. It may be hollow, or may befilled or partially filled with liquids, solids, gases, or combinationsthereof. By way of example only, energy application zone 9 may includean interior of an enclosure, interior of a partial enclosure, openspace, solid, or partial solid, that allows existence, propagation,and/or resonance of electromagnetic waves. In some embodiments, energyapplication zone 9 may include the interior of a cavity (e.g., aresonant cavity), may constitute a cavity, or may be limited to aportion of a cavity. Zone 9 may include a conveyor belt or a rotatingplate. At times, energy application zone 9 may be congruent with theobject or a portion of the object (e.g., the object or a portionthereof, is or may define the energy application zone).It is to beunderstood that an object is considered “in” the energy application zoneif at least a portion of the object is located in the zone or if someportion of the object receives delivered electromagnetic radiation.

In accordance with some embodiments of the invention, an apparatus ormethod may involve the use of at least one source configured to deliverelectromagnetic energy to the energy application zone (e.g., configuredto supply energy to the radiating element(s)). A “source” may includeany components) that arc suitable for generating and deliveringelectromagnetic energy. Consistent with some embodiments of theinvention, electromagnetic energy may be delivered to the energyapplication zone in the form of propagating electromagnetic waves atpredetermined wavelengths or frequencies (also known as electromagneticradiation). As used consistently herein, “propagating electromagneticwaves” may include resonating waves, evanescent waves, and waves thattravel, through a medium in any other manner.

As used herein, if a machine (e.g., a processor) is described as“configured to” perform a task (e.g., configured to cause application ofa predetermined field pattern), then, at least in some embodiments, themachine may include components, parts, or aspects (e.g., software) thatenable the machine to perform the particular task. In some embodiments,the machine performs this task during operation. Similarly, when a taskis described as being done “in order to” establish a target result(e.g., in order to apply a plurality of electromagnetic field patternsto the object), then, at least In some embodiments, carrying out thetask would accomplish the target result.

In certain embodiments, electromagnetic energy may be applied to anobject 13. References to an “object” to which electromagnetic energy isapplied is not limited to a particular form. An object may include aliquid, semi-liquid, solid, semi-solid, or gas, depending upon theparticular process with which the invention is utilized. The object mayalso Include composites or mixtures of matter in differing phases. Thus,by way of non-limiting example, the term “object” encompasses suchmatter as food to be defrosted or cooked; clothes or other wet materialto be dried; frozen organs or other biological materials to be thawed;chemicals to be reacted; fuel or other combustible material to becombusted; hydrated material to be dehydrated, gases to be expanded;liquids to be heated, boiled or vaporized, or any other material forwhich there is a desire to apply, even nominally, electromagneticenergy.

In some embodiments, object 11 may constitute at least a portion of aload. For example, a portion of electromagnetic energy delivered toenergy application zone 9 may be absorbed by object 11. In someembodiments, another portion of the electromagnetic energy delivered toenergy application zone 9 may be absorbed by various elements associatedwith energy application zone 9 (e.g., additional objects, structures, orany other electromagnetic energy-absorbing materials found in zone 9).Energy application zone 9 may also include loss constituents that donot, themselves, absorb an appreciable amount of electromagnetic energy,but otherwise account for electromagnetic energy losses. Such lossconstitutes may include, for example, cracks, seams, joints, doors,interface between cavity and door, or any other loss mechanismsassociated with energy application zone 9. Thus, in some embodiments, aload may include at least a portion of object 11 along with anyelectromagnetic energy-absorbing constituents in the energy applicationzone as well as any electromagnetic energy loss constituents associatedwith the zone.

FIGS. 1A and 1B are diagrammatic representation of an apparatus 100 forapplying electromagnetic energy to an object.

Exemplary apparatuses 100 may be part of an oven (e.g., cooking oven),vending machine, chamber, tank, dryer (e.g., cloth dryer), thawer,dehydrator, reactor, engine, chemical or biological processingapparatus, furnace, incinerator, material shaping or forming apparatus,conveyor, combustion zone, cooler, freezer, etc.

Cavity 9 may be rectangular in shape (or any other suitable shape, suchas cylindrical, semi-cylindrical, hemispherical cuboid, symmetrical,asymmetrical, irregular, regular, among others) and may be made of aconductor, such as aluminum, stainless steel or any suitable metal orother conductive material. In some embodiments, cavity 9 may includewalls coated and/or covered with a protective coating, for example, madefrom materials transparent to electromagnetic energy, e.g., metallicoxides or others. Cavity 9 may be resonant in a predetermined range offrequencies (e.g., within the UHF or microwave range of frequencies,such as between 300 MHz and 3 GHz, or between 400 MHz and 1 GHZ). It isalso contemplated that zone 9 may be closed, e.g., completely enclosed(e.g., by conductor materials), bounded at least partially, or open,e,g., having non-bounded openings. The general methodology of theinvention is not limited to any particular cavity shape orconfiguration, as discussed earlier. While the invention is not limitedto energy application zone of certain structure, each energy applicationzone mentioned herein may be resonant cavity, capable of supportingstanding and/or semi-propagating waves at frequencies above a cutofffrequency.

In the presently disclosed embodiments, apparatus 100 may include aplurality of radiating elements. The radiating elements may be locatedon one or more surfaces of, for example, an enclosure defining theenergy application zone. Alternatively, radiating elements may belocated inside or outside the energy application zone. One or more ofthe radiating elements may be near, in contact with, in the vicinity ofor even embedded in object 11 (e.g., when the object is a liquid). Theorientation and/or configuration of each radiating element may bedistinct or the same, based on the specific energy application, e.g.,based on a desired target effect. Each radiating element may bepositioned, adjusted, and/or oriented to emit electromagnetic wavesalong a same direction, or various different directions. Furthermore,the location, orientation, and configuration of each radiating elementmay be predetermined before applying energy to the object. Alternativelyor additionally, the location, orientation, and configuration of eachradiating element may be dynamically adjusted, for example, by using aprocessor, during operation of the apparatus and/or between rounds ofenergy application.

As shown in FIGS. 1A and 1B, apparatus 100 may include a plurality ofradiating elements 2018 for delivery of electromagnetic energy to energyapplication zone 9. One or more of the radiating element(s) may also beconfigured to receive electromagnetic energy from energy applicationzone 9. In other words, radiating element, as used herein may functionas an emitter, a receiver, or both, depending on a particularapplication and configuration. When a radiating element acts as areceiver of electromagnetic energy from an energy application zone(e.g., reflected electromagnetic waves), the radiating element mayreceive electromagnetic energy from the energy application zone.

As used herein, the term “radiating element” may broadly refer to anystructure designed for the purposes of radiating or receiving energy,regardless of whether the structure serves any additional function. Insome embodiments, a radiating element may include an antenna. Forexample, a radiating element may include an aperture/slot antenna, amonopole antenna, a loop antenna, a dipole antenna, an inverted Fantenna, etc. In some embodiments, a radiating element may include aplurality of terminals emitting in unison, either at the same time or ata controlled dynamic phase difference (e.g., a phased array antenna).The radiating element may be an antenna, although the term antenna isusually used in the art in free space, and radiating elements, as usedherein, serve a similar purpose in cavities, as well as in any otherkind of energy application zone. Consistent with some exemplary,embodiments, radiating element 2018 may include an electromagneticenergy emitter (referred to herein as “a emitting radiating element”)that feeds energy into electromagnetic energy application zone 9, anelectromagnetic energy receiver (referred herein as “a receivingradiating element”) that receives energy from zone 9, or a combinationof both an emitter and a receiver. An electromagnetic emitter may besupplied with RF energy, for feeding into the energy application zone,from an amplifier. An electromagnetic receiver may be connected to adetector configured to detect signals received by the receiver. Acombination of a receiving and emitting radiating element may beconnected both to an amplifier and to a detector. In some embodiments, afirst radiating element may be configured to emit electromagnetic energyto zone 9, and a second radiating element may be configured to receiveenergy from the first radiating element. In some embodiments, one ormore radiating elements may each serve as both receivers and emitters.In some embodiments, one or more radiating elements may serve a dualfunction while one or more other radiating elements may serve a singlefunction. At times, in addition to or as an alternative to deliveringand/or receiving energy, a radiating element may also be adjusted toaffect the field pattern. For example, various properties of theradiating element, such as position, location, orientation, etc., may beadjusted. Different radiating element property settings may result indiffering electromagnetic field patterns within the energy applicationzone thereby affecting energy absorption in the object. Therefore,radiating element adjustments may constitute one or more variables thatcan be varied for energy application control.

Consistent with the presently disclosed embodiments, energy supplied toan emitting radiating element is referred to herein as “incidentenergy”. A portion of the incident energy may be dissipated in theobject or absorbed by the object or by other loss constituents in theenergy application zone. This portion of the incident energy may bereferred to herein as “dissipated energy” or “absorbed energy”. Anotherportion may be received by the radiating elements from the energyapplication zone. The received portion may include energy reflected backto the emitting radiating element (referred to herein as “reflectedenergy”) and energy coupled to another one of the radiating elements(coupled energy). When coherent energy application is used, there is noway to differentiate between reflected energy and coupled energy, anduse of received energy alone may be sufficient.

In certain embodiments, the application of electromagnetic energy mayoccur via one or more power feeds. A power feed may include one or morewaveguides and/or one or more radiating elements for applyingelectromagnetic energy to the zone. Such radiating elements may include,for example, patch radiating elements, fractal radiating elements, helixradiating elements, log-periodic radiating elements, spiral radiatingelements, slot radiating elements, dipole radiating elements, loopradiating elements, slow wave radiating elements, leaky wave radiatingelements or any other structures capable of emitting and/or receivingelectromagnetic energy.

The invention is not limited to radiating elements having particularstructures or locations. Radiating elements may be polarized indiffering directions in order to, for example, reduce coupling, enhancespecific field pattern(s), increase the energy delivery efficiency andsupport and/or enable a specific algorithm(s). Any suitable number ofradiating elements (such as two, three, four, five, six, seven, eight,etc.) may be used e.g., three radiating elements may be placed parallelto orthogonal coordinates. A higher number of radiating elements may addflexibility in system design and improve control of energy distribution,e.g., greater uniformity and/or resolution of energy application in zone9.

FIG. 2 is a diagrammatic illustration of an apparatus 200 according tosome embodiments of the invention. Apparatus 200 may include one or moreenergy application units 210, 260. An energy application unit mayinclude one or more radiating elements (212, 262, 264) and an RF energysource (220, 270) configured to supply RF energy to the radiatingelement(s). Energy application zone 280 may or may not be included aspart of apparatus 200. Each RF energy source may be structured similarlyto source 2010 shown in FIG. 1A or 1B. In some embodiments, an energyapplication unit may include two or more synchronized RF energy sources,which may be controlled to feed the radiating elements with signalshaving a common frequency, a controlled phase difference, and/or acontrolled amplitude difference, etc. In some, energy application units,radiation originating in the same source may be split, and modulated inphase and/or amplitude to supply to the energy application zone signalswith controlled phase and/or amplitude differences. In some embodiments,the apparatus may include more than one source of electromagneticenergy, and/or more than one energy application unit. For example, morethan one oscillator may be used for generating AC waveforms of differingfrequencies. In some embodiments, for example, when two energyapplication units apply energy at mutually different frequencies, energymay be applied from each of the energy application units individually(i.e., one at a time) or, alternatively, energy may be appliedconcurrently from two or snore of the energy application units, with thesame or similar processing effects. In some embodiments, for example,when two energy application units apply energy coherently with eachother, they may have the effect of a single energy application unit,with the number of radiating elements given by the sum of the numbers ofthe radiating elements included in each of the energy application units.Therefore, a similar discussion may be relevant both to apparatusesincluding one energy application unit and to apparatuses including aplurality of energy application units, and the invention may beimplemented irrespective of the number of energy application unitsincluded in the apparatus. An energy application unit may be controlledby a processor 290. For example, processor 290 may set the value of eachcontrollable field affecting parameter (c-FAP, e.g., frequency, phasecombination, and/or amplitude combination) to define excitation setupsat which energy may be applied to energy application zone 280. In someembodiments, processor 290 may control the energy application unitsbased on input the processor receives from detectors 295, 296, 297. Eachof detectors 295, 296, and 297 may receive electromagnetic feedback fromone of radiating elements 212, 262, and 264, respectively. The detectorsmay include, for example, power meters, field sensors, samplers (e,g.,directional couplers). In some embodiment, a single detector may beused, and it may detect feedback from another one of the radiatingelements at a time, for example, by a suitable time divisionarrangement. In some embodiments, processor 290 may control the energyapplication units based on input the processor receives from sensors,e.g., sensor 298. The sensors may be used to sense any information,including, for example, electromagnetic power, temperature, weight,humidity, motion, etc. The sensed information may be used for anypurpose, including process control, verification, automation,authentication, safety, etc.

An energy application unit according to some embodiments (e.g., each ofunits 260 and 270) may be set, e.g., by processor 290, to apply energyat two or more different excitation setups. Applying energy at differentexcitation setups may result in excitation of different field patternsin the energy application zone. The excitation setups may differ fromone another by one or more values of parameters that may affect thefield pattern and may be controlled by components of the apparatus. Sucha parameter is referred to herein as a c-FAP (controllable fieldaffecting parameter). En some embodiments, a value may be selected foreach c-FAP, and the excitation setup may be defined by the selectedvalues. Varying a selected value of even one c-FAP varies the excitationsetup, which, in turn, may vary the field pattern excited in the energyapplication zone. It is noted that when an excitation setup includesenergy application through a plurality of radiating elements together,all the radiating elements apply energy at the same frequency. If tworadiating elements concurrently apply energy at two differentfrequencies these may be considered as two excitation setups appliedconcurrently, and not as a single excitation setup.

In some cases, varying values of c-FAPs may result in significantvariations in the excited field patterns. In other instances, however,varying values of c-FAPs may produce little or no change in the excitedfield patterns (e.g., if the variation between the two values of thec-FAP is small).

Applying energy at a particular excitation setup may excite anelectromagnetic field pattern in the energy application zone. Forbrevity, this excited electromagnetic field pattern may be referred toas an excitation. Thus, each excitation setup may correspond to anexcitation; and a reference to a supply, reception, absorption, leakage,etc. of an excitation setup may refer to a supply, reception,absorption, leakage, etc. of the corresponding excitation. Thus, forexample, a statement that a given excitation or excitation setup isabsorbed in the object may mean that energy associated with anelectromagnetic field excited by the energy application unit at thegiven excitation setup is absorbed in the object.

Various apparatuses may allow the control of different field affectingparameters. For example, in sortie embodiments, an apparatus may includea processor that controls the frequency of an electromagnetic waveapplied by an energy application unit to the energy application zone. Insuch apparatuses, the frequency may be available as a c-FAP. In oneexample, such an apparatus may control the frequency to have any of twoor more values, e.g. 800 MHz, 800.5 MHz, 900 MHz, 2400 MHz, etc. Bycontrolling the frequency and changing from one frequency value toanother, the excitation setup may be changed, which, in turn, may changean electromagnetic field pattern excited in the energy application zone.

In another example, an energy application unit may include two radiatingelements that emit radiation at a controllable phase difference. Thephase difference may be controlled to have two or more values, e.g., 0°,90′, 180°, or 270°. The phase difference between electromagnetic fieldsemitted by the two radiating elements may be available to the apparatuscomprising the energy application unit as a c-FAP. In some embodiments,more than two radiating elements may be provided, and a phase differencebetween each two of them miry constitute a c-FAP. In some embodiments,the values of all such c-FAPs collectively (e.g., 90° between radiatingelement 1 and 2, 150° between radiating element 2 and 3, and so on) maybe referred to as a phase relation. A phase difference between tworadiating elements may include a specific case of a phase relation, forexample, when only two radiating elements are involved. A phase relationbetween r antennas may include up to n−1 phase differences, each ofwhich may, in principle, be set independently of the other phasedifferences.

In another example, a difference between intensities at which tworadiating elements emit electromagnetic fields of the same frequency mayhe controlled, and thus may be available as a c-FAP. In someembodiments, more than two radiating elements may be provided, and anintensity difference (also referred to herein as an amplitudedifference) between each two of them may constitute a c-FAP. In someembodiments, the values of all such c-FAPs collectively (e.g., powersupplied to radiating element No. 2 is half that supplied to radiatingelement No. 1, power supplied to radiating element No. 3 is 0.3 thatsupplied to radiating element No. 1, and so on) may be referred to as anamplitude relation. An amplitude relation between n antennas may includeup to n−1 amplitude differences or ratios, each of which may, inprinciple, be set independently of the other amplitude differences orratios.

Excitation setups including only a single c-FAP may be referred to asone-dimensional excitation setups. An excitation setup includingmultiple c-FAPS may be referred to as a multi-dimensional excitationsetup. For example, an apparatus comprising two radiating elements,where the phase difference between them is controllable in addition tocontrollability of the frequency may be configured to generatetwo-dimensional excitation setups. The collection of all the excitationsthat may be excited by an apparatus (or the collection of all theexcitation setups available to an apparatus) may be referred to as theexcitation space of the apparatus. The dimension of an excitation spaceof an apparatus may be the same as the dimension of each excitationsetups available to that apparatus.

In some embodiments, an energy application unit may be controlled by aprocessor configured to control energy application in accordance withfeedback. The feedback may be indicative, for example, of thetemperature, weight, position, volume, or any other characteristic ofthe object. Additionally, or alternatively, the feedback may includeelectromagnetic feedback.

As used herein, electromagnetic (EM) feedback may include any receivedsignal or any value calculated based on one or more received signals,which may be indicative of the dielectric or electrical response of thecavity and/or the object to electromagnetic fields excited in thecavity. For example, electromagnetic feedback may include any signalthat may be indicative of a scattering parameter of a system comprisingthe energy application zone and the object. Such a system is referred toherein as a cavity-abject system. For example, electromagnetic feedbackmay include input and output power levels, network parameters, e.g., Sparameters, Y parameters, reflection and transmission coefficients,impedances, etc., as well as values derivable from them. Examples ofderivable values may include dissipation ratios (discussed below), timeor excitation setup derivatives of any of the above, etc.Electromagnetic feedback may be excitation-dependent and may, forexample, include signals, the values of which may vary over differentexcitation setups. In some embodiments, electromagnetic feedback,measured when energy is applied at various excitation setups, may beused for controlling energy application.

Returning to FIGS. 1A and 1B, the figures provide diagrammaticrepresentations of exemplary apparatuses 100 for applyingelectromagnetic energy to an object, in accordance with some embodimentsof the present invention.

In some embodiments, apparatus 100 may involve the use of at least onesource 2010 configured to supply electromagnetic energy to the energyapplication zone. By way of example, and as illustrated in FIG. 1A, thesource may include one or more of an RF power supply 2012 configured togenerate electromagnetic waves (also referred to herein as AC waveforms)that carry electromagnetic energy. For example, power supply 2012 may bea magnetron configured to generate high power microwave waves at apredetermined wavelength or frequency. In some embodiments, power supply2012 may include a semiconductor oscillator, such as a voltagecontrolled oscillator, configured to generate AC waveforms (e.g., ACvoltage or current). In some embodiments, a source of electromagneticenergy may include any other power supply, such as electromagnetic fieldgenerator, electromagnetic flux generator, direct digital synthesizer(DDS) or any mechanism for generating vibrating electrons.

The frequency of the waveform may be controllable, for example, by afrequency control signal sent to the RF power supply from the at leastone processor. Similarly, a phase difference between waveforms emittedby two or more of the radiating elements may be controlled. The controlmay be by one or more phase control signals, sent from the at least oneprocessor to the source, to source 2010 or to a component therein. Forexample, phase control signals may be sent to phase modulator 2014 or toRE power supply 2012, for example, if the RF power supply controls thephase of a waveform it supplies, as in the case of a DDS. In someembodiments, amplitude ratio between amplitudes of waveforms emitted bytwo or more of the radiating elements may be controlled. The control maybe by way of one or more control signals sent from processor 2030 tosource 2010 or to one or more components thereof, for example, toamplifiers 24 and 28 (FIG. 1B). In sonic embodiments, the RF powersupply may control the amplitude of the signals it generates (e.g., aDDS), and the amplitude control signals may include signals sent to theRF power supply. The control signals may go through control lines, likethose marked in FIG. 1B as arrows going from processor 2030 tooscillator 22, phase shifter 54 and amplifiers 24 and 28.

In accordance with some embodiments, apparatus 100 may include at leastone processor 2030. As used herein, the term “processor” may include anelectric circuit that performs a logic operation on input or inputs. Forexample, such a processor may include one or more integrated circuits,microchips, microcontrollers, microprocessors, all or part of a centralprocessing unit (CPU), graphics processing unit (GPU), digital signalprocessors (DSP), field-programmable gate array (FPGA) or other circuitsuitable for executing instructions or performing logic operations. Theinstructions executed by the processor may, for example, be pre-loadedinto the processor or may be stored in a separate memory unit such as arandom access memory (RAM), a read-only memory (ROM), a hard disk, anoptical disk, a magnetic medium, a flash memory, other permanent, fixed,or volatile memory, or any other mechanism capable of storinginstructions for the processor. The processor(s) may be customized for aparticular use, or can be configured for general-purpose use and canperform different functions by executing different software.

If more than one processor is employed, all may be of similarconstruction, or they may be of differing constructions electricallyconnected or disconnected from each other. They may be separate circuitsor integrated in a single circuit. When more than one processor is used,they may be configured to operate independently or collaboratively. Theymay he coupled electrically, magnetically, optically, acoustically,mechanically or by other means permitting them to interact. Processor2030 may regulate modulations performed by modulator 2014. In someembodiments, modulator 2014 may include at least one of a phasemodulator and/or an amplitude modulator. In some embodiments, theamplitude modulator may include an amplifier 2016 configured to controlthe amplitude of the signal supplied to the radiating element. In someembodiments, a phase modulator may include a splitter and a phaseshifter, for example, as shown in FIG. 1B. In some embodiments, thesignals may be generated by a direct digital synthesizer (DDS), whichmay include frequency, phase, and amplitude modulators. Phase modulator(e.g., modulator 2014) may be controlled to perform a predeterminedsequence of time delays on an AC waveform, such that the phase of the ACwaveform is increased by a number of degrees 10 degrees) for each of aseries of time periods. In some embodiments, processor 2030 maydynamically and/or adaptively regulate such phase modulation based onfeedback from the energy application zone.

In FIG. 1B, modulator 2014 may accomplish phase modulation using, e.g.,splitter 52 and phase shifter 54. Splitter 52 may be configured to splita signal generated by oscillator 22 into two split signals. Phaseshifter 54 may be configured to shift the phase of one of the splitsignals. The phase shifter may be controllable, for example by a phasecontrol signal arriving from processor 2030. In some embodiments, thephase shifter may be configured to cause a time delay in the AC waveformin a controllable manner, delaying the phase of an AC waveform anywherefrom between 0-360 degrees. Thus, the processor may determine a phasedifference between signals applied by the two radiating elements 2018,and control the phase shifter accordingly. In some embodiments, phasedifference between signals supplied to two or more radiating elementsmay be obtained directly from the RE source—for example: the outputfrequency and the phase emitted from each radiating element may bedetermined by the source (for example, by using a Direct DigitalSynthesizer).

Processor 2030 may be configured to regulate the phase modulator, e.g.,by sending a phase control signal to phase modulator 2014 in order toalter a phase difference between two electromagnetic waves supplied tothe energy application zone. In some embodiments, source 2010 may beconfigured to supply electromagnetic energy in a plurality of phaserelations, and the processor may be configured to cause the transmissionof energy at a subset of the plurality of phase relations. The phaserelations at which energy is applied may be selected by processor 2030based on dissipation ratios (or other quality indicators) calculated ormeasured for various phase relations. For example, processor 2030 mayselect for application phase relations associated with the highestdissipation ratios, with dissipation ratios that are within apredetermined range, etc.

The processor may be configured to regulate an amplifier in order toalter an amplitude of at least one electromagnetic wave supplied to theenergy application zone. In FIG. 1B, amplitude modulation mayaccomplished by amplifiers 24 and 28, each of which amplifying one ofthe split signals. Amplifiers 24 and 28 may each have a controllablegain. For example, the gain of each of them may be controlledindependently by a gain control signal arriving from processor 2030.Thus, the processor may determine an amplitude (or intensity, or power)difference (or ratio) between signals applied by the two radiatingelements 2018, and control the amplifiers accordingly.

Processor 2030 may be configured to regulate an oscillator (which mayform part of RF power supply 2012) to sequentially generate AC waveformsoscillating at various frequencies within one or more predeterminedfrequency bands. In some embodiments, a predetermined frequency band mayinclude a working frequency band, and the processor may be configured tocause the transmission of energy at frequencies within a sub-portion ofthe working frequency band. In some embodiments, based on the feedbacksignal provided by detector 2040, processor 2030 may be configured toselect one or more frequencies or sub-bands from a frequency band, andregulate an oscillator to sequentially generate AC waveforms at theseselected frequencies.

Although FIGS. 1A and 1B illustrate circuits, each including tworadiating elements 2018, it should be noted that any number of radiatingelements may be employed, and the processor may select combinations ofexcitation setups through selective use of radiating elements. By way ofexample only, in an apparatus having three radiating elements A, B, andC, the processor may choose applying energy at excitation setupsemploying radiating element A alone, radiating elements A and B while Cdoes not emit, simultaneously emitting from all the radiating elements,etc. Each radiating element 2018 may receive energy from an amplifier(24 or 28) and from cavity 9. The signals may go through couplers (e.g.,dual directional couplers 34 and 38 illustrated in FIG. 1B), configuredto direct signals coming from the amplifiers to the radiating elements,and signals coming from the cavity to detector 2040. In someembodiments, a circulator (not illustrated) may be provided between theamplifier and the radiating element to direct reflected power front theradiating element to a dummy load.

One or more processors may be configured to cause electromagnetic energyto be applied to zone 9 via a plurality of radiating elements, forexample across a series of excitation setups, in order to applyelectromagnetic energy to object 11 at each of the excitation setups.For example, the at least one processor may be configured to regulateone or more components of apparatus 100 (e.g., oscillator 22, phaseshifter 54, amplifier 24 and/or amplifier 28), in order to cause theenergy to be applied at excitation setups selected from the excitationspace of apparatus 100. In some embodiments, for example, processor 2030may regulate a source (e.g., source 2010 of FIG. 1A or FIG. 1B) to applyenergy at excitation setups that include applying energy through two ormore radiating elements at overlapping time periods at the samefrequency and at differing phase relations and/or at differing amplituderelations.

In certain embodiments, the at least one processor may be configured todetermine a quality indicator—for example: a value indicative of energyabsorbable by the object at each of a plurality of excitation setups.This may occur, for example, using one or more lookup tables, bypre-programming the processor or memory associated with the processor,and/or by testing an object in an energy application zone to determineits absorbable energy characteristic. One exemplary way to conduct sucha test is through a sweep.

As used herein, a sweep may include, for example, the transmission overtime of energy at more than one excitation setups. For example, duringan excitation setup sweeping process, the at least one processor mayregulate the energy supplied to the at least one radiating element tosequentially deliver electromagnetic energy at various excitation setupsto zone 9, and to receive feedback which serves as an indicator of theenergy absorbable by object 11.

During the sweeping process, RF source 2010 may be regulated byprocessor 2030 based on electromagnetic feedback detected by detector(e.g., detector 2040 illustrated in FIG. 1A or 1B). Processor 2030 maythen determine a value indicative of energy absorbable by object 11 ateach of a plurality of excitation setups based on the received feedback,in some embodiments, certain excitation setups may he swept, and basedon the feedback received therein, energy absorbable values may becalculated for other excitation setups. For example, in someembodiments, S parameters may be measured during a sweep for variousfrequencies, each transmitted by one of the radiating elements at atime. These S parameters may be used for calculating dissipation ratiosor other values indicative of energy absorbable in the object atexcitation setups. The S parameters may be used in this manner insituations including concurrent energy application by two or more of theradiating elements at the same frequencies, at given phase relationsand/or particular amplitude relations. In another example, gammaparameters may be measured at certain excitation setups, and these maybe used for calculating S parameters. In turn, the calculated Sparameters may be used for calculating gamma parameters, dissipationratios, or other parameters indicative of energy absorbable in theobject at other excitation setups.

Consistent with some of the presently disclosed embodiments, a valueindicative of the absorbable energy may include a dissipation ratio(referred to herein as “DR”). A dissipation ratio value may beassociated with each of a plurality of excitation setups. As referred toherein, a “dissipation ratio” (or “absorption efficiency” or “heatingefficiency”), may be defined as a ratio between electromagnetic energy(or power) absorbed by (or dissipated in) energy application zone 9 withobject 11 therein, and electromagnetic energy supplied to radiatingelements 2018.

Energy that may be dissipated or absorbed by the energy application zonewith an object therein is referred to herein as “absorbable energy” or“absorbed energy”. Absorbable energy may be an indicator of the object'scapacity to absorb energy or the ability of the apparatus to causeenergy to dissipate in a given object (for example an indication of theupper limit thereof). In some of the presently disclosed embodiments,absorbable energy may be calculated as a product of the incident energy(e.g., maximum incident energy) supplied to the at least one radiatingelement and the dissipation ratio. Received energy (e.g., the energysupplied to the radiating element and not absorbed) may, for example, bea value indicative of energy absorbed by the object. By way of anotherexample, a processor might calculate or estimate absorbable energy basedon the portion of the incident energy that is not received back from theenergy application zone. That estimate or calculation may serve as avalue indicative of absorbed and/or absorbable energy. When energy isapplied through several radiating elements at the same frequency and atoverlapping time periods it may be practically impossible to distinguishbetween energy reflected back to, for example, radiating element No. 1,and energy coupled to radiating element No. 1 that originates inradiating element No. 2. Thus, in such cases, the dissipated energy maybe determined as a difference between the total incident energy suppliedto all the radiating elements and the total received energy, received byall the radiating elements. It is noted that in other cases, forexample, when one radiating element transmits at a time, a dissipationvalue may be assigned to each of the radiating elements, while in thepresent case, where radiating elements transmit concurrently at a commonfrequency, there may be one dissipation value common to all theradiating elements.

During an excitation setup sweep, the at least one processor may beconfigured to control a source of electromagnetic energy such thatenergy is sequentially applied at a series of excitation setups. The atleast one processor may then receive a signal indicative of energyreceived at each radiating element when energy is applied at eachexcitation setup. Using a known amount of incident energy supplied tothe radiating element and a known amount of energy received back fromthe energy application zone, an absorbable energy indicator may becalculated or estimated. Alternatively, the processor might simply relyon an indicator of reflection and/or transfer coefficients as a valueindicative of absorbable energy.

In some of the presently disclosed embodiments, a dissipation ratio maybe calculated using formula (1), (1A), or (1B):

DR=P _(abs) /P _(in)   (1)

DR=(P _(in) −P _(rf) −P _(cp))/P _(in)   (1A)

DR=(P _(in) −P _(received))/P _(in)   (1B)

where P_(in) represents the electromagnetic energy and/or power suppliedto radiating elements 2018, P_(abs) represents the electromagneticenergy and/or power absorbed by the object, P_(rf) represents theelectromagnetic energy reflected/returned at those radiating elementsthat function as emitters, P_(cp) represents the electromagnetic energycoupled at those radiating elements that function as receivers, andP_(received) represents the total energy and/or power received by theradiating elements. Equation 1A may be derived from equation 1 under theassumption that all energy or power that is neither reflected back tothe emitting radiating element nor coupled to a receiving radiatingelement is absorbed by the object. DR may be a value between 0 and 1,and thus may be represented by a percentage number. The DR defined informula (1 A) may differ between radiating elements. The DR defined informula (1B) may be suitable for use with excitation setups that includeconcurrent energy application at a common frequency from a plurality ofradiating elements, and may be associated with the system as a whole,and not with a particular radiating element. In all cases, however, theDR may have a value between 0 and 1, and can be expressed as apercentage ratio.

For example, consistent with some embodiments which include threeradiating elements, (e.g., 262, 264, and 212) indexed with indexes 1, 2,and 3, a processor (e.g., processor 2030 or 290) may be configured todetermine input reflection coefficients S₁₁, S₂₂, and S₃₃ and thetransfer coefficients may be S₁₂=S₂₁, S₁₃=S₃₁, S₂₃=S₃₂ based on ameasured power and/or energy information during the sweep. Accordingly,the dissipation ratio DR corresponding to radiating element 1 may bedetermined based on the above mentioned reflection and transmissioncoefficients, according to formula (2):

DR _(I) =I−(IS ¹¹ I ² +IS ₁₂ I ² +IS ₁₃ I ²).   (2)

In some embodiments, a common DR may be defined for the two radiatingelements, for example, as provided in equations 3.1 and 3.2:

DR ¹⁺² =P _(abs)/(P _(in) ¹ +P _(in) ²)   (3.1)

DR ¹⁺²=[(P _(in) ¹ +P _(in) ²)−(P _(out) ¹ +P _(out) ²)]/(P _(in) ¹ +P_(in) ²)   (3.2)

wherein the P_(in) ¹ and P_(in) ² are the power (or energy) incident atradiating element 1 and 2, respectively; and P_(out) ¹ and P_(out) ² arethe power (or energy) received at radiating element 1 and 2,respectively. The common DR may be particularly useful when energy isapplied by two or more radiating elements simultaneously, e.g., at acontrolled phase-relation.

For example, equations 3.1 and 3.2 may be useful, where radiatingelements 1 and 2 concurrently apply energy at the same frequency. It isnoted, however, that this DR (which may be referred to herein ascoherent DR) may be calculated from S parameters, but not by formula(2). For calculating coherent DR, the complex values of the S parametersmay be required, and also the knowledge of the phase and amplitudedifferences at which energy is applied through radiating elements 1 and2. A method for calculating coherent DR based on S parameters isprovided below,

Absorbable energy values may be used, for example, for setting energyapplication parameters. For example, an amount of energy applied at eachexcitation setup, time duration of energy application at each excitationsetup (also referred to as transmission duration), and/or power level atwhich energy is applied at each excitation setup may be set. Forexample, the energy application parameters may be set based on, e.g., afunction of one or more quality indicators—e.g., absorbable energyvalues. In some embodiments, the setting may be accomplished by at leastone processor, e.g., processor 2030 or 290,

The energy supplied to at least one radiating element 2018 at each ofthe excitation setups may be determined as a function of the absorbableenergy value at each excitation setup (e.g., as a function of adissipation ratio, input impedance, a combination of the dissipationratio and the input impedance, or some other indicator). In someembodiments, the energy applied to the zone at each excitation setup maybe determined based on or in accordance with electromagnetic feedbackobtained daring an excitation setup sweep. That is, using theelectromagnetic feedback, the at least one processor may adjust energyapplied at each excitation setup such that the energy at a particularexcitation setup may in some way be a function of an indicator ofabsorbable energy (or other electromagnetic feedback) associated withthat excitation setup. The invention may encompass any technique forcontrolling the energy applied by taking into account an indication ofabsorbable energy.

Because absorbable energy can change based on a host of factorsincluding object temperature, in some embodiments it may be beneficialto regularly update absorbable energy values (e,g., during objectprocessing) and adjust energy application based on the updatedabsorbable values. These updates can occur multiple times a second, orcan occur every few seconds or longer, depending on the requirements ofa particular application.

As mentioned, an aspect of some embodiments of the invention may includea method of processing an object in an energy application zone byapplication of RF energy. In some embodiments, the processing mayinclude RF energy applications in two or more cycles. The cycles may beorganized in pairs, such that the first cycle in each pair may be usedfor applying a small amount of energy (e.g., through excitation setupsweep) and receiving feedback in response to the energy application; andthe second cycle in each pair may be used for applying RF energy in anamount sufficient to process the object. The energy applied during thesecond cycle may be based on or adjusted in accordance with the receivedfeedback. The first cycle may include energy application at a firstplurality of excitation setups. In the second cycle, RF energy may heapplied at one or more excitation setups that may be selected based onthe feedback, e.g., from excitation setups available to the apparatusused for the processing. Energy application at the selected one or moreexcitation setups may be based on energy application parameters (e.g.,time duration and/or power level) selected based on the feedback.

In some embodiments, the second cycle in a pair may include energyapplication at one or more excitation setups not included in the firstcycle in the pair. This way, in some embodiments, energy applicationparameters may be selected for an excitation setup based on feedbackreceived in response to RF energy applied at other excitation setupsonly. In some embodiments, only excitation setups that did not takeplace in the first cycle may be selected for the second cycle. Forexample, where in the first cycle each radiating element emits at adifferent time period, and in the second cycle, at one or more of theexcitation setups, two or more radiating elements may emit atoverlapping time periods. In another example, in some embodiments, gammaparameters may be measured at some phase relations during the, firstcycle, and one or more excitation setups of other phase relations may beselected for application in the second cycle.

In some embodiments, absolute values of reflection coefficients (|I|²)may be measured at a certain number of excitation setups that differfrom each other in phase relations between radiations emitted by two ormore power feeds. The reflection coefficients may be used forcalculating EM feedback (e.g., values indicative of energy absorbed inthe object) at other phase relations, for example, using a methoddescribed in detail herein.

In another example, the first cycle may include: energy application viaa single radiating element at any given time, and measurement of complexS parameters (each associated with one emitting radiating element),while energy is not applied through the other radiating elements. Thesecomplex S parameters may be used for calculating S parameters and/orabsorption efficiencies, and/or values of any other EM feedbackparameter, at each arbitrary phase relation between radiations emittedby two or more of the radiating elements at overlapping time periods.These calculated values may be used in selecting excitation setupsand/or in determining energy application parameters at excitationsetups, including excitation setups not included in the first cycle, forexample, excitation setups that include energy application by two ormore of the radiating elements at overlapping time periods.

In some embodiments, the average amount of energy applied per excitationsetup in a first cycle in a pair of cycles may be smaller than theaverage amount of energy applied per excitation setup in the secondcycle in the pair. For example, an average power level, at which energyis applied per excitation setup may be higher during the second cyclethan during the first cycle. For example, if energy is applied via asingle radiating element at a time during a first cycle, and via fourradiating elements during overlapping time periods in the second cycle,the average power level applied during the second cycle may be largerthan during the first cycle. Average energy applied per excitation setupat a first cycle may be smaller than that applied at a second cycle by afactor of, for example, 2, 4, 5, 10, 50, 100, 500, or any intermediatenumber. The same principle may be applied also with other numbers ofradiating elements. Furthermore, in some embodiments, more energy may besupplied to each radiating element in the second cycle than in thefirst, such that the total amount of energy applied per excitation setupmay exceed the abovementioned ratios between power levels.

Additionally, or alternatively, an average time duration, during whichenergy is applied per excitation setup, may be longer during the secondcycle than during the first cycle. The ratio between average timeduration in a second and first cycle of the same pair may be, forexample, 2, 4, 50, 10, 50, 100, 500, or any intermediate or largerratio.

An aspect of some embodiments of the invention may include an apparatusfor processing an object with RF energy. The object may be in an energyapplication zone, to which RF energy is applied. The apparatus mayinclude an energy application unit, a detection unit, and a controller.The latter may include at least one processor. The terms controller,processor, and at least one processor, are used herein interchangeably.The energy application unit may be configured to apply to the energyapplication zone RF energy at a plurality of excitation setups. Thedetection unit may be configured to detect electromagnetic feedback fromthe energy application zone, and the controller may be configured toassociate electromagnetic feedback received from the detection unit withthe excitation setups, in response to which the feedback was received.The terms detector and detection unit are used herein interchangeably.The controller may further be configured to cause application of energyby the energy application unit in a second cycle, based on feedbackdetected by the detection unit in the first cycle. In some embodiments,the controller may be configured to cause the application of energy inthe second cycle at one or more excitation setups not included in thefirst cycle.

It may be noted, that in some embodiments, one or more, or even all theradiating elements used in the first cycle may be used in the secondcycle. For example, there may be four radiating elements, each radiatingseparately in the first cycle, and all radiating together (e.g., at acontrolled phase relation between them) at the second cycle.

In some embodiments, the detection unit may be configured to receivefeedback from a single radiating element at any given time. In some such(and other) embodiments, the controller may be configured to causeapplication of RF energy at two or more radiating elements duringoverlapping time periods, for example, to cause application of RF energyat an excitation setup characterized by a given phase relation betweenradiations emitted via two or more of the radiating elements.

In some embodiments, the processor may be configured to determineabsorption efficiencies (and/or other EM feedback related values) at asecond plurality of excitation setups that may include excitation setupsnot included in the first cycle. The second cycle may then includeexcitation setups selected from the plurality of excitation setupsavailable to the apparatus.

For example, the first cycle may include energy application at a givenfrequency via a single radiating element at a time, and based on Sparameters obtained from feedback received during the first cycle,absorption efficiencies may be calculated for excitation setups thatinclude energy application at the given frequency via two or moreradiating elements at overlapping time periods. The second cycle mayinclude energy application at the given frequency via two or moreradiating elements at overlapping time periods at a phase relation. Thesecond cycle may also include excitation setups, for which absorptionefficiencies were calculated. In another example, the first cycle mayinclude energy application via two or more radiating elements atoverlapping time periods, at a common frequency, and at a certain phaserelation between radiations emitted by each of the two or more radiatingelements. Absorption efficiencies may then he calculated based onfeedback received during the first cycle, for excitation setups notapplied during the first cycle. One or more of these excitation setupsmay be selected for application during the second period, and thus, oneor more of the excitation setups used in the second cycle may includeenergy application at some other phase relations, not included in thefirst cycle. In both examples, the second cycle may also include energyapplication at one or more of the excitation setups, used during thefirst cycle.

In some embodiments, the absorption efficiencies may be analyticallycalculated based on measured values. For example, absorptionefficiencies may be analytically calculated for certain phase relationsbased on S parameters measured when energy was applied via one radiatingelement at a time, and no phase relations existed. In another example,absorption efficiencies at certain phase relations may be analyticallycalculated based on gamma parameters measured at other phase relations.A target parameter (e.g., absorption efficiency) may be analyticallycalculated for an excitation setup based on measured values (e.g.,values of S or gamma parameters), and regardless of the absorptionefficiencies calculated for other excitation setups. Analyticalcalculation may differ from interpolation or extrapolation in whichtarget parameters at some excitation setups may be calculated based onvalues of target parameters calculated for other excitation setups.

In some embodiments, one or more of the feedback parameters may beindicative of a difference between phases of two signals such as, forexample, a difference between phase of forward voltage and phase of abackward voltage. In some embodiments, the detection unit may includeone or more components configured to detect a phase difference betweentwo signals. The phase of the forward parameter (e.g., the phase of aforward voltage), the phase of a backward parameter (e.g., the phase ofa backward voltage), and the difference between such phases, etc., mayeach constitute a feedback parameter. Detecting a phase of a feedbackparameter may include extracting from the feedback signal information ona phase of the feedback signal and/or sending to the controller suchinformation or a signal indicative of such information. Phase-relatedinformation may be useful in computing feedback values associated withexcitation setups not included in the first cycle. For example, thedetector may be configured to extract information regarding magnitudeand phase of an S parameter (measured with energy being applied at agiven frequency via one radiating element while all the other radiatingelements function only as receivers at the given frequency), and thesemay be used in calculating energy absorption efficiencies associatedwith various phase relations between radiations emitted from two or moreradiating elements at the given frequency at overlapping time periods.

In some embodiments, however, the detection unit may be sensitive mainlyto the amplitude of the signal or to a ratio between amplitudes ofsignals such as, e.g., a ratio between the absolute value of a forwardvoltage and the absolute value of a backward voltage. A detection unitof this kind may be configured to provide information only regarding theamplitude of the feedback signals, and may be non-sensitive to phase ofa detected signal and/or may be configured not to send to the controllerinformation regarding phase of the signal; or the controller may beconfigured not to receive information concerning the phase or not tobase its operation on the phase, if received from the detection unit.Information relating to absolute values of feedback signals may beembodied in real (as opposed to complex) values. In some suchembodiments, the controller may be configured to use such real values(and in some cases, no complex or phase values) in computing energyabsorption efficiencies associated with excitation setups not includedin the first cycle. For example, in some embodiments, the first cyclemay include energy application at excitation setups that include energyapplication via two or more radiating elements at overlapping timeperiods, and the detector may extract from the feedback informationincluding absolute (real) values of reflection coefficients, andsubstantially no information regarding the phases or the reflectioncoefficients. These real values may be used in determining energyabsorption efficiencies at excitation setups that are not included inthe first cycle, for example, excitation setups that include energyapplication at phase relationships other than those included in thefirst cycle.

FIG. 3 represents a method for applying electromagnetic energy to anobject in accordance with some embodiments of the present invention.Electromagnetic energy may be applied to an object, for example, throughat least one processor (e.g., processor 2030 or 290) implementing aseries of steps of method 500 of FIG. 3.

In certain embodiments, method 500 may involve controlling a source ofelectromagnetic energy. A source of electromagnetic energy may also bereferred to herein as a “source”. By way of example only, in step 520,the at least one processor may control an energy application unit and/orRF energy source (for example, source 2010 (shown in FIG. 1A or 1B).

The source may be controlled to supply RF energy at a first plurality ofexcitation setups (e.g., at a plurality of frequencies and/or phasecombinations and/or amplitude combinations etc.) to at least oneradiating element, as indicated in step 520. Various examples ofexcitation setup supply, including sweeping, as discussed earlier, maybe implemented in step 520. Alternatively or additionally, other schemesfor controlling the source may be implemented so long as that schemeresults in the supply of energy at a plurality of excitation setups. Insome embodiments, the amount of energy supplied during step 520 may besmall enough not to cause a detectable change in the properties of theobject. This may be accomplished, for example, by applying energy at lowpower levels and/or for short durations. The power levels and limedurations may be low and short, for example, in comparison to powerlevels and time durations used during execution of step 540, discussedbelow.

In some embodiments, method 500 may include step 525, in which feedbackmay be received from the energy application zone in response to theenergy application at step 520. The feedback may include electromagneticfeedback. A value of a feedback parameter may vary between from oneexcitation setup to another, in which case, the feedback may be referredto as excitation setup dependent, and may be received during anexcitation setup sweep.

In certain embodiments, the method may further involve associatingabsorption efficiencies and/or other values indicative of energyabsorbable by the object to each of a second plurality of excitationsetups, in step 530. In some embodiments, the value may be associatedwith an excitation setup based on feedback received in step 525. In someembodiments, a value indicative of energy absorbable in the object (alsoreferred to herein as an absorbability indicator or AI) may beassociated with a certain excitation setup based on feedback received inresponse to energy application at one or more other excitation setups.An absorbable indicator may include any indicator—whether calculated,measured, derived, estimated or predetermined—of an object's capacity toabsorb energy. For example, the processor may be configured to determinean absorbable energy value, such as dissipation ratio, for eachexcitation setup of the second plurality, and associate the determinedvalue with the excitation setup for which the value was determined. Insome embodiments, the second plurality of excitation setups may includeone or more excitation setups not included in the first plurality ofexcitation setups, at which energy is supplied in step 520.

In certain embodiments, method 500 may also involve step 540, in whichan amount of RF energy is supplied at one or more excitation setupsbased on the absorbable energy value associated to mob of the excitationsetups of the second plurality in step 530. For example, in step 540,the processor may determine an amount of energy to be applied at anexcitation setup, as a function of the absorbable energy valueassociated with that excitation setup in step 530. For example, if adissipation ratio is between 0 and 0.3 the amount of energy may be setto zero (and no energy will be applied at excitation setups associatedwith dissipation ratios within this range); if a dissipation ratio isbetween 0.3 and 0.7, the amount of applied energy may be 1 joule; and ifa dissipation ratio is between 0.7 and 1, the amount of applied energymay be 0.5 joule. These are merely numerical examples, and any otherexample of a function of absorbability indicators may be used fordetermining the amounts of energy applied at the various excitationsetups. In some embodiments, the amount of energy applied at anexcitation setup may be a function of the absorbable energy valueassociated with that excitation setup, for example, the absorbableenergy value may be defined by DR and energy may be applied in amountsproportional to DR, to 1/DR, etc.

In some embodiments, the amount of energy supplied during step 540 maybe large enough to cause a detectable change in the properties of theobject. Thio, may he accomplished, for example, by applying energy atsufficient power levels and/or for sufficient durations to cause achange in at least one property associated with the object. The powerlevels and time durations may be high and long, respectively, forexample, in comparison to power levels and time durations used duringexecution of step 520, discussed above. In some embodiments, energyapplication at each excitation setup of the first plurality may beshorter, e,g,, by a factor of 5, 10, 100, or any intermediate of largerfactor, than energy application at each excitation setup in step 540. Insome embodiments, the average energy application duration per excitationsetup may be shorter in step 520 than in step 540, e,g., by a factor of10, 100, or any intermediate of larger factor. The average energyapplication duration per excitation setup may be equated with the totalduration of energy application during execution of a step, divided bythe number of excitation setups at which energy has been applied in thesame step,

In some embodiments, the at least one processor may determine a weight,e.g., power level, time duration, amount of energy, or other energyapplication parameters, used for supplying the determined amount ofenergy at each excitation setup in step 540, as a function of theabsorbable energy value associated with the same and/or other excitationsetups. For example, an amplification ratio of amplifier 2016 may bechanged inversely with the energy absorption characteristic of object 11at each excitation setup. In some embodiments, when the amplificationratio is changed (e.g. inversely relative to the energy absorptioncharacteristic), energy may be supplied for a constant amount of time ateach excitation setup, and the energy supplied at each excitation setupmay vary in line with the amplification ratio. Alternatively oradditionally, the at least one processor may determine varying durationsat which the energy is supplied at each excitation setup. For example,the duration and power may vary from one excitation setup to another,such that their product correlates (e,g,, inversely) with the absorptioncharacteristics of the object. In some embodiments, the processor mayuse the maximum available power at each excitation setup, which may varybetween excitation setups. This variation may be taken into account whendetermining the respective durations at which the energy is supplied atmaximum power at each excitation setup. In some embodiments, the atleast one processor may determine both the power level and time durationfor supplying the energy at each excitation setup. In certainembodiments, step 540 may involve applying RF energy at a plurality ofexcitation setups. Respective weights may be assigned to each of theexcitation setups to be emitted, for example, based on the absorbableenergy value as discussed above.

In step 560, it may be determined whether the energy transfer should beterminated. Energy application termination criteria may vary dependingon application. For example, for a heating application, terminationcriteria may be based on time, temperature, total energy absorbed, orany other indicator that the process at issue is compete. For example,heating may be terminated when the temperature of object 11 rises to apredetermined temperature threshold. In another example, in thawingapplication for example, termination criteria may include any indicationthat the entire object is thawed. Additionally or alternatively, energyapplication may be stopped upon receiving a “stop” instruction, e.g.,from a user interface.

If, in step 560, it is determined that energy transfer should beterminated (step 560: yes), energy transfer may end in step 570. If thecriterion or criteria for termination is not met (step 560: no), theprocess may return to step 520, and energy may be supplied again at afirst plurality of excitation setups. The first plurality of excitationsetups at which energy is supplied in step 520 may vary each time step520 is executed. In some embodiments, steps 520-540 may be repeatedduring object processing.

For example, after a pair of energy application cycles has beenexecuted, the object properties may have changed, which may or may notbe related to the electromagnetic energy application. Such changes mayinclude a temperature change, translation/movement of the object (e.g.,if placed on a moving conveyor belt or on a rotating plate), change inshape (e.g., mixing, melting or deformation for any reason), volumechange (e.g., shrinkage or puffing), water content change (e.g.,drying), flow rate change, change in phase of matter, chemicalmodification, etc. Therefore, at times it may be desirable to change thevariables of energy application, for example, in response to these orother changes. Such a change may be accomplished by repeating steps 520,525, and 530, and applying energy based on the results of these steps,possibly at new energy application parameters. The new energyapplication parameters may include, for example: a new set of excitationsetups at which to apply energy;, an amount of electromagnetic energy tobe applied at each of the excitation setups in the set; a weightingfactor; a power level of the excitation setup(s); and/or a duration atwhich the energy is supplied at each excitation setup in the set.Consistent with some of the presently disclosed embodiments, lessexcitation setups may be swept in step 520 than those swept in step 540.

Method 500 may include applying RF energy repetitively, wherein eachrepetition comprises: (a) applying a first amount of RF energy to theenergy application zone at a first plurality of excitation setups (step520), e.g., through one radiating element at a time; (b) receivingfeedback in response to the energy application (step 525); arid (c)applying a second amount of RF energy to the energy application zone ata second plurality of excitation setups (step 540). Each time step 520is executed (e.g., as a result of a decision that energy transfer is notyet complete) may be considered a new repetition. The second pluralityof excitation setups may be the same or different from the firstplurality of excitation setups. The second plurality of excitationsetups may include one or more excitation setups via two or moreradiating elements at overlapping time periods, at a common frequency,and at controlled phase relations. In some embodiments, each executionof steps 520 or 540 may be considered an energy application cycle, andeach execution of steps 520 and 540 (not separated by step 560) may beconsidered a pair of energy application cycles. In some embodiments,comparison of power levels, time durations, arid/or amounts of energyapplied during execution of step 520 and 540 may be within a singlepair.

FIG. 4 is a diagrammatic representation of time durations, during whichtwo radiating elements of an energy application unit may operate duringexecution of method 500. The upper half of FIG. 4 (marked 400) showsoperation times of radiating element No. 1, and the lower half of FIG. 4(marked 450) shows operation times of radiating element No. 2. Althoughthe power is shown to have two values, which may correspond to “on” and“our, in some embodiments, the power during the “on” periods may vary,for example, in accordance with hardware limitations to produce power atvarious frequencies.

Step 520 of FIG. 3 may be reflected in a first energy application cycle410 shown in FIG. 4. Step 525 may take place concurrently with step 520.First energy application cycle 410 may include a first time period, fromt₀ to t₁, (marked 405), during which radiating element No. 1 may emit RFradiation, while radiating element No. 2 may function as a receiver.Period 405 may be used for measuring S parameters S₁₁ and S₂₁ at a firstplurality of excitation setups. The excitation setups in the firstplurality may differ from each other, for example, in frequency values.First energy application cycle 410 may further include a period lastingfrom t₁ to t₂ (marked 412), during which radiating element No. 1 mayoperate in a receiving mode, and radiating element No. 2 may operate inan emitting mode. Period 412 may be used for measuring S parameters S₁₂and S₂₂ at a second plurality of excitation setups. The excitationsetups in the second plurality may differ from each other, for example,in frequency values. In some embodiments, the same frequencies are usedin periods 405 and 412, such that for each frequency a set of four Sparameters may be obtained: S₁₁, S₁₂, S₂₁, and S₂₂. Periods 405 and 412collectively (i.e., the time period between t₀ and t₂, marked 410) maybe termed a first energy application cycle, or first cycle. In someembodiments, the complex values of the S parameters may be measuredduring the first cycle, that is, both the absolute values and the phasesof the S parameters may be measured.

Step 530 of method 500 may take place during a period between t₂ and t₃(marked 415), during which both radiating elements may be inactive.Period 415 may be utilized for computing energy absorption efficienciesor other parameters, based on feedback received from the energyapplication zone during the first energy application cycle, e.g., basedon the measured S parameters. The computed parameters may be associatedwith excitation setups not applied during the first cycle. For example,parameters may he computed for excitation setups where the two radiatingelements emit energy at overlapping time periods, although this has nothappened during first cycle 410.

During a fourth time period, going between t₃ and t₄ and marked 420,energy may be applied via both radiating elements simultaneously.Furthermore, in some embodiments, a phase relation between radiationsemitted by the two radiating elements may be controlled. For example,energy may be emitted by the two radiating elements simultaneously, atdifferent phase relations consecutively. For example, energy may beapplied at 800 MHz at phase differences of 30°, 60°, and 90°. In someembodiments, frequencies may also be controlled to change consecutively.For example, in the preceding example, after application of energy at800 MHz at phase differences of 30°, 60°, end 90°, energy may be appliedat 820 MHz at the same phase difference (i.e., 30°, 60°, and 90°, and soon. Energy application along period 420 may be termed a second energyapplication cycle, or a second cycle. The first cycle and the secondcycle together (in some embodiments, in conjunction with the periodgoing between t₂ and t₃) may compose pair 430 of energy applicationcycles, or a pair. A second pair of energy application cycles, goingfrom t₄ to t₈ is also shown in FIG. 4, and marked 440. In someembodiments, a frequency sweep is performed at each antenna, and Sparameters are measured for each frequency. For example, in a systemwith two antennas, during a frequency sweep of antenna 1, S₁₁ and S₂₁may be measured at each frequency, and during a frequency sweep ofantenna 2, S₂₂ and S₁₂ may be measured at each frequency. Based on thesemeasurements, DR may be calculated at the swept frequencies for anyphase relation, using equation A shown above.

It is noted that energy application according to some embodiments of theinvention may include a first energy application cycle at a plurality ofexcitation setups and may also include a second energy applicationcycle, which includes energy application at one or more excitationsetups not included applied in the first energy application cycle.

In some embodiments, energy application in the second cycle is based onfeedback received in response to energy application in the first cycle.

Alternatively, or additionally to basing the energy application in thesecond cycle on the feedback, energy application in the first cycle maybe for an average duration per excitation setup shorter than an averageduration of an excitation setup during the second energy applicationcycle. If energy is applied at a plurality of pairs of cycles (each paircomprising a first cycle and a second cycle), the averages may bemeasured for each pair separately. In some embodiments, the averages maybe calculated over multiple pairs, such that over the multiple pairs,the average amount of energy applied per excitation setup in all firstcycles is smaller than the average amount of energy applied perexcitation setup in all second cycles.

Still alternatively, or additionally to basing the energy application inthe second cycle on the feedback, more energy per excitation setup maybe applied on the average during the second cycle than during the firstcycle. Here also, if energy is applied at a plurality of pairs of cycles(each pair comprising a first cycle and a second cycle), the averagesmay be measured for each pair separately, or, in some embodiments, overa plurality of pairs,

Still alternatively, or additionally to basing the energy application inthe second cycle on the feedback, higher power level may be used (on theaverage per excitation setup) during the second cycle than during thefirst cycle. Here also, if energy is applied at a plurality of pairs ofcycles (each pair comprising a first cycle and a second cycle), theaverages may be measured for each pair separately, or, in someembodiments, over a plurality of pairs.

In some embodiments, a method of processing an object in an energyapplication zone (e.g., method 500) may include applying RF energy tothe energy application zone at excitation setups, each beingcharacterized by two or more radiating elements that emit, atoverlapping time periods, signals of a common frequency (e,g., in step520), Step 530 may then include calculating values indicative of energyabsorbable in the object at multiple excitation setups, characterized bythe common frequency and differing phase combinations, amplitudecombinations, or both phase combinations and amplitude combinations. Thecalculation may be based on measurements taken at other excitationsetups characterized by the common frequency (e.g., measurements made atstep 525), and applying the RF energy based on the calculated values(e.g., in step 540).

The measurements may include measuring parameters indicative ofelectrical responses cat the energy application zone with the objecttherein to electrical signals characterized by the common frequency.Such parameters may include, for example, gamma parameters, Sparameters, or other kind of network parameters and/or combinationsthereof. The electrical signal may include any electrical field appliedto the energy application zone through the radiating elements.

The method may include calculating the values indicative of energyabsorbable in the object based on the measured parameters (e.g., in step530). In some embodiments, this calculation may be further based on thephase combination and/or amplitude combination characterizing theexcitation setups for which the values are calculated.

in some embodiments, applying the RF energy based on the calculatedvalues (e.g., in step 540) may include selecting excitation setups fromthe multiple excitation setups for which values indicative of energyabsorbable in the object were calculated. The selection may be based onthe calculated values. Energy application at the selected excitationsetup may include controlling a source of RF energy (e.g., source 2010)to generate RE signals of a common frequency and different phasecombinations and/or different amplitude combinations.

In some embodiments, applying the RF energy may further includechoosing, for each excitation setup to be applied, energy applicationparameters. The energy application parameter may include, for example,time duration for which the excitation setup is applied and/or powerlevel at which the excitation setup is applied. Application of the RFenergy may then include application at the chosen energy applicationparameters.

In some embodiments, the method may include application of RF energy ata plurality of frequencies. In some such embodiments, energy may beapplied (e.g., in step 520) each time at a different frequency and/orthrough a different radiating element. For example, first one antennamay emit energy consecutively at some frequencies, and then anotherantenna may emit energy at the same frequencies, and so one. Then, thecalculation of values indicative of energy absorbable in the object maybe automatically repeated at each repetition for a different one of thefrequencies. In some embodiments, excitation setups selected forapplication may include two (or more) excitation setups characterized bythe same frequency.

FIG. 5 is a diagrammatic presentation of a method according to someembodiments of the invention, emphasizing the number of excitationsetups that may be used at each stage. In a first stage, marked 310,which may include step 520 of FIG. 3, energy may be applied to a firstplurality of excitation setups, collectively marked 312, and feedbackmay be received in response to this energy application. In the figure,all the excitation setups applied during the first stage are marked witha superscript 1, and a subscript denoting a serial number of theexcitation setup within the first plurality of excitation setups.

Then, in a second stage, marked 320, which may include step 530 of FIG.3, one or more parameter values may be determined for each of a secondplurality of excitation setups, based on the feedback. Each of thedetermined values may be associated with the respective excitationsetup, for which it was determined. The second plurality of excitationsetups, marked collectively 322, may include excitation setups notincluded in the first plurality, or even may consist of excitationsetups not included in the first plurality. For example, in the firststage, energy may be applied via each radiating element separately, andall the excitation setups in the second plurality may involve energyapplication by two or more radiating elements at overlapping timeperiods, e.g., at a controlled phase difference and/or at a commonfrequency. As apparent in the figure, the number of excitation setups inthe second plurality (designated by M) may be larger than the number ofexcitation setups in the first plurality (designated by N). In someembodiments, M may be larger than N by a factor of 2, 5, 10, 15, or anyintermediate or larger factor.

In a third stage, marked 330, which may include, for example, step 540of FIG. 3, energy may be applied at one or more of the excitationsetups, to which parameter values were associated in the second stage.In the depicted example, only one excitation setup (marked in the figureas ESU_(selected) ²) has been selected for energy application in thethird stage. In other embodiments, however, other numbers of excitationsetups may be selected for energy application.

Equation (A) below shows how a DR value may he associated with anyamplitude relation ({right arrow over (α)}) and phase relation ({rightarrow over (φ)}) between radiations emitted by n radiating elements,based on measurements taken when only one radiating element emits RFradiation at any given time period. Equation A′ is for a singlefrequency. Similar calculations may be carried out at variousfrequencies, at each of which the measured S parameters may be differentand the phase and amplitude relations may be controlled.

$\begin{matrix}{{{{DR}\left( {\overset{\rightarrow}{a},\overset{\rightarrow}{\phi}} \right)} = {1 - \frac{\text{?}}{\text{?}}}}{\text{?}\text{indicates text missing or illegible when filed}}} & \left( A^{\prime} \right)\end{matrix}$

In equation (A′), {right arrow over (α)} a represents relations betweenamplitudes of voltages supplied to the radiating elements and {rightarrow over (φ)} represents relations between phases of voltages suppliedto the radiating elements. S_(ik) is a complex scattering parameter,representing the ratio

$\frac{V\text{?}}{V_{k}^{+}},{\text{?}\text{indicates text missing or illegible when filed}}$

wherein V_(i) ⁻ represents the (complex) voltage received at radiatingelement of index i when the (complex) voltage supplied at the radiatingelement indexed k was V_(k) ⁺ and all radiating elements other than kare inactive; |α_(ki)| is the ratio between amplitudes of voltagesconcurrently supplied to radiating elements k and i; and φ_(ki) is thephase difference between voltages concurrently supplied to radiatingelements k and i, j represents the square root of −1. Equation A′ issimilar to equation A, shown above, but in A′ the parameters |α_(ki)|are ratios between amplitudes, and in equation A the correspondingparameters α_(k) are amplitudes.

In some embodiments, the values of |α_(ki)| and/or φ_(ki) may becontrolled, e.g., by processor 2030. In some embodiments, the amplituderatio |α_(ki)| may he fixed, and only phase differences may becontrolled. In some embodiments, the phase differences may be fixed, andonly amplitude ratios may be controlled. Thus, for every frequency theremay be measured a set of S parameters, based on which there may becalculated a DR value for each set of amplitude and phase relationships.Among such relationships, some may be selected for application based onthe DR values calculated for them. For example, in some embodiments,relationships for which DR values between some upper threshold and somelower threshold may be selected. The thresholds may be predetermined(e.g., the upper threshold may be 0.9 and the lower threshold may be0.5). In some embodiments, the thresholds may be determined dynamically;for example, in relation to DR, which may be defined as the highest DRvalue calculated to be obtainable at the frequency, for which thecalculations were carried out. For example, the lower threshold may be0.6 DR_(max), and the upper threshold may be 0.85 DR_(max).

In some embodiments, absorbability indicators other than DR may becalculated based on the complex S parameters, phase relation, andamplitude relations. These may include, for example, 1-DR or any otherfunction of DR, for example, (1−DR)Σ_(k=1) ^(n)|α_(k1)|²=Σ_(i=1)^(n)|Σ_(k=1) ^(n)S_(ik)|e^(jφ) ^(ki) |². The latter absorbabilityindicator may be particularly useful, for example, when Σ_(k=1)^(n)|α_(k1)|² is controlled to be the same for all the excitationsetups, for example, when α_(ki) is the same for all values of k and atall the excitation setups.

To measure the complex S parameters, a detector detecting receivedfeedback may include a phase detector configured to detect phase valuesassociated with the electromagnetic feedback received, for example, fromavailable radiating elements. In some embodiments, each repetition ofstage 310 includes energy application at the same first plurality ofexcitation setups; each repetition of stage 320 includes associatingcontrol parameters with the same second plurality of excitation setups;and each repetition of energy applications 330 may be at a differingselected plurality of excitation setups,

In some embodiments, the amplitude and the phase of the suppliedradiation may he controlled, and thus may be known. In some embodiments,however, the amplitude and phase may also be measured to verify that theenergy application unit is controlled as intended. In some embodiments,the received voltage at each radiating element and/or the scatteringparameters may be measured when no two radiating elements transmit atoverlapping time periods. Based on these measurements, a DR value may becalculated for each phase relation ({right arrow over (φ)}) andamplitude relation ({right arrow over (α)}) in accordance with equation(A).

In some embodiments, measurement of DR as a function of the phaserelation may be calculated based on real (rather than complex)parameters. This may omit the need to use a phase detector. Thus, insome embodiments, the feedback received is indicative only, orsubstantially only of the amplitude (absolute value) of the detectedparameter. The number of measurements required for calculating DR at anynumber of phase relations may be smaller than the number of phaserelations, albeit larger than twice the number of power feeds. Forexample, the phase independent parameters may be |Γ_(i)|², which may beequated with, the ratio between power received at feed i and powersupplied through feed 1 at a given excitation setup. The absolute valueof the reflection coefficient measured at a feed indexed i may be givenby the equation

${\Gamma_{i}}^{2} = \frac{\text{?}}{\text{?}}$?indicates text missing or illegible when filed

Thus, measuring powers (or other scalar values that scale with thepower) may allow obtaining the absolute values of the reflectioncoefficients.

On the other hand, the (complex) reflection coefficient Γ_(i) may beexpressed by equation (B):

$\begin{matrix}{\Gamma_{i} = {\sum_{j = 1}^{n}{\frac{V_{j}^{+}}{V_{i}^{+}}S_{i,j}}}} & (B)\end{matrix}$

wherein n is the number of power feeds, V_(j) ⁺ is the voltage suppliedthrough the feed of index j, and S_(i,j) is a scattering parameter.V_(j) ⁺ has an absolute value and a phase, both of which may becontrolled, e.g., by processor 2030. Based on equation B, another set ofequations may be written, in which |Γ_(i)|² may be expressed as afunction of the complex S parameters. Thus, every measurement of areflection coefficient |Γ_(i)|² may be a value given by an equation withn² complex unknown values S_(i,j). These equations may be solved for allthe scattering parameters if measurements are provided for a sufficientnumber of phase relations. This sufficient number is usually larger than2n. For example, if there are four power feeds, and the amplituderelations between them is fixed, e.g., at a value of 1, measuring|Γ_(i)|² at 13 phase relations may suffice to obtain the values of allthe 16 complex S parameters, based on which DR may be calculated for anyother phase relation using equation (A). Thus, a method according tosome embodiments may include (a) measuring magnitudes of gammaparameters at a first plurality of excitation setups; (b) calculating,based on the measured magnitudes, complex S parameters, (c) calculating,based on the calculated complex S parameters, dissipation ratios at oneor more excitation setups not included in the first plurality ofexcitation setups; and (d) applying energy based on the calculateddissipation ratios.

In Some embodiments, in a first energy application cycle, measurementsmay be made at a first plurality of phase relations. Based on thesemeasurements, DR may be associated with each phase relation of a secondplurality of phase relations. The second plurality of phase relationsmay include any phase relation, including, but not limited to, thoseincluded in the first plurality of phase relations. For example, thefirst plurality of phase relations may include 13 phase relations, andthe second plurality of phase relations may include 64 phase relations.At least 51 of the 64 phase relations included in the second pluralityof phase relations are different than the 13 phase relations at whichmeasurements have taken part in practice. Then, one or more phaserelations may be selected from the second plurality of phase relations,e.g., based on the DR value associated with the phase relations includedin the second plurality of phase relations. Then, in a second energyapplication cycle, energy may be applied to the energy application zoneat the selected phase relation(s) so as to heat or otherwise process theobject. The second energy application cycle may be longer than the firstenergy application cycle, and/or may include application of more energythan applied in the first energy application cycle.

For example, the average amount of energy applied per excitation setup(e.g., per phase relation) at each of the excitation setups in the firstplurality of excitation setups may be larger than the average amount ofenergy applied per excitation setup in the second energy applicationcycle. The average amount of energy applied per excitation setup in anenergy application cycle may be calculated by dividing the total energyapplied during the energy application cycle by the number of differentexcitation setups, at which energy was applied during the same energyapplication cycle.

Additionally or alternatively, the average duration of energyapplication per excitation setup (e.g., per phase relation) at each ofthe excitation setups in the first plurality of excitation setups may besmaller than the average duration of energy application per excitationsetup in the second energy application cycle. The average duration ofenergy application per excitation setup in an energy application cyclemay be calculated by dividing the total duration of energy applicationin the energy application cycle by the number of different excitationsetups, at which energy was applied during the same energy applicationcycle.

FIG. 6 is a diagrammatic representation of a processor (e.g. processor2030) configured to control a source of RF energy based onelectromagnetic feedback: according to some embodiments of theinvention. Processor 2030 may include a memory 602 or have access to anexternal memory. The memory may have a storage space 604 for storingfeedback received from the detectors. Some examples of data that may bestored in storage space 604 include values of S parameters, for example,magnitudes of S parameters and/or phases thereof. Some additionalexamples may include gamma parameters: scalar (e.g., magnitudes only),or complex (e.g., magnitude and phases). The content of storage space604 may be refreshed, for example, each time an excitation sweep iscarried out to obtain feedback from the energy application zone. Memory602 may further include storage space 606, for storing excitation setupsselection rules. These rules may determine which excitation setup isselected for application, and which is not, based on control parameterassociated with each of the excitation setups. For example, the controlparameter may be a dissipation ratio, and the rule may be that onlyexcitation setups associated with dissipation ratios within a givenrange are selected for application. Memory 602 may also include astorage space 608 for storing rules for setting energy applicationparameters. These rules may indicate, for example, at what power leveland for what duration each selected excitation setup may be applied at agiven energy application cycle.

In some embodiments, excitation setup selection rules may be set throughan interface (610), for example, user interface. In some embodiments,different rule sets may be available in memory 602, and the interfaceallows a user to select between them. Similarly, rules for settingenergy application parameters may be set through interface 610.

The feedback parameters stored in storage space 604 may be retrieved foruse by control parameter calculation module 612. Module 612, as well asother modules described below, may be embodied in a software module,hardware module, or may comprise both software and hardware componentsassociated with the processor. Module 612 may be configured to calculatecontrol parameters based on feedback parameters retrieved from memory602. For example, module 612 may calculate dissipation ratios at variousphase combinations based on complex a parameters saved on memory 602.Module 612 may associate each excitation setup with the controlparameter calculated for the excitation setup.

Processor 2030 may further include an excitation setup selection module614 Excitation setup selection module 614 may select excitation setupsfor application based on the control parameter associated with them bycontrol parameter calculating module 612 and rules retrieved fromstorage space 606.

In some embodiments, processor 2030 may further include energyapplication parameters setting module 616: Module 616 may set, for eachexcitation setup selected for application by modulo 614, energyapplication parameters, for example power level and energy transmissionduration. The module may set the energy application parameters based onrules retrieved, for example, from storage space 608, and controlparameters calculated, e.g., for the selected excitation setups, bymodule 612.

Processor 2030 may also include a control module 620 that sends theappropriate control signals to source 2010 (FIGS. 1A and 1B), so as toapply the selected excitation setups at the set energy applicationparameters. The control signals may include, for example, frequencycontrol signals, phase control signals, and amplitude control signals.

In the foregoing Description of Exemplary Embodiments, various featuresare grouped together in a single embodiment for purposes of streamliningthe disclosure. This method of disclosure is not to be interpreted asreflecting an intention that the claimed invention requires morefeatures than are expressly recited in each claim. Rather, as thefollowing claims reflect, inventive aspects lie in less than allfeatures of a single foregoing disclosed embodiment. Thus, the followingclaims are hereby incorporated into this Detailed Description, with eachclaim standing on its own as a separate embodiment of the invention.

Moreover, it will be apparent to those skilled in the art fromconsideration of the specification and practice of the presentdisclosure that various modifications and variations can be made to thedisclosed systems and methods without departing from the scope of theinvention, as claimed. For example, one or more steps of a method and/orone or more components of an apparatus or a device may be omitted,changed, or substituted without departing from the scope of theinvention. Thus, it is intended that the specification and examples beconsidered as exemplary only, with a true scope of the presentdisclosure being indicated by the following claims and theirequivalents.

1-54. (canceled)
 55. A method of processing an object in a cavity byapplication of radio frequency (RF) energy via a plurality of radiatingelements, the method comprising: applying a first amount of RF energy tothe cavity at a first plurality of excitation setups, wherein applyingenergy at each excitation setup of the first plurality of excitationsetups comprises applying RF energy via a plurality of radiatingelements at a common frequency and during overlapping time periods; foreach radiating element, measuring during the application of each of theplurality of excitation setups, electromagnetic feedback; and applying asecond amount of RF energy to the energy application zone at one or moreexcitation setups, at least one of which is not included in the firstplurality of excitation setups and selected based on the electromagneticfeedback.
 56. The method of claim 55, wherein applying energy at eachexcitation setup of the first plurality of excitation setups comprisescontrolling the common frequency and a phase difference between signalsemitted by different ones of the radiating elements.
 57. The method ofclaim 55, wherein applying energy at each excitation setup of the firstplurality of excitation setups comprises controlling the commonfrequency and an amplitude ratio or amplitude difference between signalsemitted by different ones of the radiating elements.
 58. The method ofclaim 56, wherein applying energy at each excitation setup of the firstplurality of excitation setups further comprises controlling anamplitude ratio or amplitude difference between signals emitted bydifferent ones of the radiating elements.
 59. The method of claim 55,wherein an average amount of energy per excitation setup applied at thefirst plurality of excitation setups is less than an average amount ofenergy per excitation setup applied at the one or more excitationsetups.
 60. The method of claim 55, wherein average energy applicationduration per excitation setup at the one or more excitation setups is atleast 10 times longer than average energy application duration perexcitation setup at the first plurality of excitation setups.
 61. Themethod of claim 55, comprising: determining a control parameter for eachexcitation setup included in a second plurality of excitation setupsbased on the electromagnetic feedback; and applying the RF energy at theone or more excitation setups based on the determined controlparameters.
 62. The method of claim 61, wherein the control parameter isan S parameter.
 63. The method of claim 61, wherein the controlparameter is a dissipation ratio.
 64. The method of claim 61, whereineach control parameter is determined based on the electromagneticfeedback by analytic calculations.
 65. The method of claim 61, whereinthe number of excitation setups included in the second plurality ofexcitation setups is at least twice the number of excitation setupsincluded in the first plurality of excitation setups.
 66. An apparatusfor processing an object in a cavity by application of radio frequency(RF) energy via a plurality of radiating elements, the apparatuscomprising: a controller configured to: cause a source of RF energy toapply a first amount of RF energy to the cavity at a first plurality ofexcitation setups, each applied by applying RF energy via a plurality ofthe radiating elements at a common frequency and during overlapping timedurations; and select at least one excitation setup not included in thefirst plurality of excitation setups based on electromagnetic feedbackreceived from the cavity during the application of the first amount ofRF energy; and cause the source to apply a second amount of RF energy tothe cavity at the selected at least one excitation setup.
 67. Theapparatus of claim 66, devoid of a phase detector.
 68. The apparatus ofclaim 66, wherein the controller is configured to control the frequencyof RF energy supplied by the source to each of the radiating elements,and a phase difference between RF signals supplied by the source todifferent ones of the radiating elements.
 69. The apparatus of claim 66,wherein the controller is configured to control the frequency of RFenergy supplied by the source to each of the radiating elements, and anamplitude ratio or amplitude difference between RF signals supplied bythe source to different ones of the radiating elements duringoverlapping time periods.
 70. The apparatus of claim 68, wherein thecontroller is configured to control an amplitude ratio or amplitudedifference between RF signals supplied by the source to different onesof the radiating elements during overlapping time periods.
 71. Theapparatus of claim 66, wherein the controller is configured to:determine a control parameter for each excitation setup included in asecond plurality of excitation setups based on the electromagneticfeedback received during the first plurality of excitation setups; andselect the at least one excitation setup not included in the firstplurality of excitation setups based on the determined controlparameters.
 72. The apparatus of claim 71, wherein the control parameteris an S parameter.
 73. The apparatus of claim 71, wherein the controlparameter is a dissipation ratio.
 74. The apparatus of claim 71, whereinthe controller is configured to determine each control parameter byanalytic calculations based on the electromagnetic feedback.